D. Neumayer

Multilevel integration of patternable low-κ material into advanced Cu BEOL

Qinghuang Lin, S. T. Chen, A. Nelson, 2010, Advanced Lithography.

Extending photo-patternable low-κ concept to 193nm lithography and e-beam lithography

Qinghuang Lin, A. Nelson, P. Brock, 2011, Advanced Lithography.

Frequency response of top-gated carbon nanotube field-effect transistors

D. Neumayer, A. Grill, J. Appenzeller, 2004, IEEE Transactions on Nanotechnology.