Kiichi Ishikawa

发表

A novel strategy of lithography-error-budget optimization for the 65-nm node: mask specifications for hyper-NA imaging

Kazuya Iwase, Ken Ozawa, Koichi Takeuchi, 2005, SPIE Photomask Technology.

Fabrication process of Cr-based attenuated phase-shift masks for KrF excimer laser lithography

Hiroichi Kawahira, Kiichi Ishikawa, Ichiro Kagami, 1999, Photomask Technology.

Development of Cr-based attenuated phase-shift mask process for 0.18-μm device generation

Hiroichi Kawahira, Kiichi Ishikawa, Ichiro Kagami, 1999, Photomask and Next Generation Lithography Mask Technology.

Nucleotide sequence of the rice cytoplasmic aldolase cDNA

Kiichi Ishikawa, Soh Hidaka, Kohichi Kadowaki, 1990, Nucleic Acids Res..

Alternating phase-shift mask and binary mask for 45-nm node and beyond: the impact on the mask error control

Tsuyoshi Tanaka, Kazuya Iwase, Yukio Inazuki, 2007, Photomask Japan.

Defect printability study of attenuated phase-shifting masks for specifying inspection sensitivity

Minoru Sugawara, Hiroichi Kawahira, Satoru Nozawa, 1995, Photomask Technology.

Phase defect printability and mask inspection capability of 65nm technology node Alt-PSM for ArF lithography

Shinji Akima, Tooru Komizo, Yutaka Kodera, 2004 .

Phase defect printability of alternating phase shift masks for ArF lithography

Hidetoshi Ohnuma, Nobuyuki Ohba, Kiichi Ishikawa, 2003, Photomask Japan.

Phase defect printability and mask inspection capability of 65-nm technology node Alt-PSM for ArF lithography (Photomask Japan Best Paper)

Shinji Akima, Tooru Komizo, Yutaka Kodera, 2004, SPIE Photomask Technology.

Attenuated phase-shifting mask specification with modified beam illumination

Keisuke Tsudaka, Minoru Sugawara, Hiroichi Kawahira, 1995, Photomask Technology.

New Systematic Evaluation Method for Attenuated Phase-Shifting Mask Specifications.

Keisuke Tsudaka, Hiroichi Kawahira, Satoru Nozawa, 1995 .