Richard E. Palmer

发表

WATERPROOFING BY INJECTION FOR PROGRAMME FLEXIBILITY AND ECONOMY

Richard E. Palmer, M Smith, R Schmid, 2003 .

Organic hard masks utilizing fullerene derivatives

Andreas Frommhold, Tom Lada, Richard E. Palmer, 2015, Advanced Lithography.

Spin-on carbon using fullerene derivatives

Andreas Frommhold, Tom Lada, Richard E. Palmer, 2014, Advanced Lithography.

Spin-on-carbon hardmask based on fullerene derivatives for high-aspect ratio etching

Andreas Frommhold, Richard E. Palmer, Alex P. G. Robinson, 2013, Advanced Lithography.

High aspect ratio etching using a fullerene derivative spin-on-carbon hardmask

Andreas Frommhold, Richard E. Palmer, Alex P. G. Robinson, 2012, Advanced Lithography.

Plasma etching of high-resolution features in a fullerene molecular resist

Richard E. Palmer, Alex P. G. Robinson, J. Manyam, 2011, Advanced Lithography.

Performance of negative tone chemically amplified fullerene resists in extreme ultraviolet lithography

Andreas Frommhold, Yasin Ekinci, Dongxu Yang, 2013 .

Low activation energy fullerene molecular resist

Richard E. Palmer, Alex P. G. Robinson, M. Manickam, 2009, Advanced Lithography.

Excited states of surfaces and nanostructures in the VUV (Invited Paper)

Richard E. Palmer, Jinlong Yin, Andre Kaplan, 2005, SPIE OPTO.

Real-space Wigner-Seitz Cells Imaging of Potassium on Graphite via Elastic Atomic Manipulation

Pekka Koskinen, Feng Yin, Richard E. Palmer, 2015, Scientific Reports.

Characterization of the effects of base additives on a fullerene chemically amplified resist

Richard E. Palmer, Alex P. G. Robinson, J. Manyam, 2010, Advanced Lithography.

Fabrication of micro/nanostructured surfaces using self-organized processes

Richard E. Palmer, Quanmin Guo, C. Arnoux, 2001, SPIE Micro + Nano Materials, Devices, and Applications.

Spin-on carbon based on fullerene derivatives as hardmask materials for high-aspect-ratio etching

Andreas Frommhold, Richard E. Palmer, Alex P. G. Robinson, 2013 .

Chemically amplified fullerene resists for e-beam lithography

Richard E. Palmer, Alex P. G. Robinson, J. Manyam, 2008, SPIE Advanced Lithography.

Fullerene Resist Materials for the 32 nm Node and Beyond

Richard E. Palmer, Alex P. G. Robinson, M. Manickam, 2008 .

Electron beam induced fragmentation of fullerene derivatives

Richard E. Palmer, Alex P. G. Robinson, Jon A. Preece, 1998 .

A triphenylene derivative as a novel negative/positive tone resist of 10 nanometer resolution

Kenneth D. M. Harris, Richard E. Palmer, Alex P. G. Robinson, 2000 .

Reactive ion etching of piezoelectric Pb(ZrxTi1−x)O3 in a SF6 plasma

Richard E. Palmer, M. Bale, R. Palmer, 1999 .

Polysubstituted derivatives of triphenylene as high resolution electron beam resists for nanolithography

Kenneth D. M. Harris, Richard E. Palmer, Alex P. G. Robinson, 2000 .

Performance of a high resolution chemically amplified electron beam resist at various beam energies

Andreas Frommhold, Edmund H. Linfield, Dongxu Yang, 2016 .

Blue-shifted plasmon resonance of individual size-selected gold nanoparticles

Lukas Novotny, Richard E. Palmer, Stefano Palomba, 2008 .

Diffusion controlled growth of metallic nanoclusters at selected surface sites

L. Kuipers, J. R. A. Cleaver, Richard E. Palmer, 1996 .

Oxidative Dehydrogenation of Cyclohexane on Cobalt Oxide (Co3O4) Nanoparticles: The Effect of Particle Size on Activity and Selectivity

Qiang Qian, Matthew Neurock, Maria Flytzani-Stephanopoulos, 2012 .

Deep plasma etching of piezoelectric PZT with SF6

Richard E. Palmer, M. Bale, R. Palmer, 2001 .

Chemically amplified molecular resists for electron beam lithography

Hasnah Mohd Zaid, Richard E. Palmer, R. Brainard, 2006 .

Structural Properties of Self-Organized Organo-Silicon Macromolecular Films Investigated by Scanning Tunneling Microscopy and X-ray Diffraction

Kenneth D. M. Harris, Richard E. Palmer, P Miao, 2000 .

Direct imaging of core-shell structure in silver-gold bimetallic nanoparticles

Jess P. Wilcoxon, Richard E. Palmer, R. Palmer, 2005 .

Fullerene-based spin-on-carbon hardmask

Andreas Frommhold, Richard E. Palmer, Alex P. G. Robinson, 2012 .

Chemically Amplified Molecular Resists for E-Beam Lithography

Richard E. Palmer, Alex P. G. Robinson, M. Manickam, 2007 .

Chapter 15 Modelling the structure and dynamics of metal nanoclusters deposited on graphite

Richard E. Palmer, Steven D. Kenny, Roger Smith, 2007 .

Colloidal Lines and Strings

Richard E. Palmer, Q. Guo, G. Su, 2003 .

Exposure mechanism of fullerene derivative electron beam resists

Richard E. Palmer, Alex P. G. Robinson, Jon A. Preece, 1999 .

Faceting of nanoscale fingers on the (111) surface of gold

Richard E. Palmer, Quanmin Guo, Q. Guo, 2006 .

Microfabrication of nanoscale cluster chains on a patterned Si surface

Richard E. Palmer, R. Palmer, Jian Liu, 1998 .

A Fullerene derivative as an electron beam resist for nanolithography

Richard E. Palmer, Alex P. G. Robinson, Jon A. Preece, 1998 .

10 nm scale electron beam lithography using a triphenylene derivative as a negative/positive tone resist

Kenneth D. M. Harris, Richard E. Palmer, Alex P. G. Robinson, 1999 .

Evidence for Field-Emission in Electroformed Metal-Insulator-Metal Devices

Richard E. Palmer, R. G. Sharpe, 1996 .

Deposition of passivated gold nanoclusters onto prepatterned substrates

A. J. Parker, Richard E. Palmer, P. A. Childs, 1999 .

Chemical Amplification of a Triphenylene Molecular Electron Beam Resist

Hasnah Mohd Zaid, Richard E. Palmer, Alex P. G. Robinson, 2007 .