L. Van Look

Characterization and control of dynamic lens heating effects under high volume manufacturing conditions

S. Hunsche, G. Vandenberghe, P. van Adrichem, 2011, Advanced Lithography.

Experimental proximity matching of ArF scanners

Joost Bekaert, L. Van Look, G. Schiffelers, 2008, Lithography Asia.

Freeform illumination sources: an experimental study of source-mask optimization for 22-nm SRAM cells

G. Vandenberghe, J. Finders, S. Verhaegen, 2010, Advanced Lithography.

Scanner matching for standard and freeform illumination shapes using FlexRay

G. Vandenberghe, J. Bekaert, L. Van Look, 2011, Advanced Lithography.

Tool-to-tool optical proximity effect matching

Geert Vandenberghe, Jeroen Van de Kerkhove, Guido Schiffelers, 2008, SPIE Advanced Lithography.

Printing the metal and contact layers for the 32- and 22-nm node: comparing positive and negative tone development process

Shinji Tarutani, V. Truffert, G. Vandenberghe, 2010, Advanced Lithography.