Ronald J. Eakin

Top antireflective coating process for deep-UV lithography

Brad Williams, Yusuke Takano, Allen C. Fung, 1999, Advanced Lithography.

Process effects resulting from conversion to a safe-solvent organic BARC

Brad Williams, Shuji Ding, Ralph R. Dammel, 1998, Advanced Lithography.

Advanced microlithography process with chemical shrink technology

Hatsuyuki Tanaka, Naoki Yasuda, Takeo Ishibashi, 2000, Advanced Lithography.

Process effects resulting from an increased BARC thickness

Ralph R. Dammel, Mark A. Spak, Ronald J. Eakin, 1997, Advanced Lithography.

Sub-half-micron i-line photolithography process using AZ BARLi

Mark A. Spak, Charles R. Spinner, Ronald J. Eakin, 1995, Advanced Lithography.

Effects of complex illumination on lithography performance

Charles R. Spinner, Ronald J. Eakin, Gregory J. Stagaman, 1996, Advanced Lithography.