Pierre Silvestre

Top antireflective coating process for deep-UV lithography

Brad Williams, Yusuke Takano, Allen C. Fung, 1999, Advanced Lithography.

Process effects resulting from conversion to a safe-solvent organic BARC

Brad Williams, Shuji Ding, Ralph R. Dammel, 1998, Advanced Lithography.

French Regulatory Project for Utilization of Thermal Process Residues (TPR) in Public Works

Patrice Piantone, Pierre Silvestre, Jacques Méhu, 2003 .