Joo-Yoo Hong

Reduction of line width and edge roughness by resist reflow process for extreme ultra-violet lithography

Han-Ku Cho, Hye-Keun Oh, Joon-Min Park, 2009, Advanced Lithography.

22nm 1:1 line and space patterning by using double patterning and resist reflow process

Hye-Keun Oh, Ilsin An, Joo-Yoo Hong, 2008, Lithography Asia.

Photoresist Adhesion Effect of Resist Reflow Process

Hye-Keun Oh, Seung-Chan Moon, Seung-Wook Park, 2007, SPIE Advanced Lithography.

Reflow modeling for elongated contact hole shape

Ji-Eun Lee, Jong-Sun Kim, Hye-Keun Oh, 2006, SPIE Advanced Lithography.

Critical dimension control for 32 nm random contact hole array with resist reflow process

Young-Min Kang, Hye-Keun Oh, Joon-Min Park, 2007, SPIE Photomask Technology.

Photoresist adhesion effect of resist reflow process

Hye-Keun Oh, Joon-Min Park, Ilsin An, 2007 .