J. K. Efavi

Impact of Al-, Ni-, TiN-, and Mo-metal gates on MOCVD-grown HfO2 and ZrO2 high-kappa dielectrics

S. Abermann, J. K. Efavi, G. Sjöblom, 2007, Microelectron. Reliab..

Comparison of metal gate electrodes on MOCVD HfO2

J. K. Efavi, Max C. Lemme, H. Kurz, 2005, Microelectron. Reliab..

Tungsten work function engineering for dual metal gate nano-CMOS

J. K. Efavi, Max C. Lemme, Heinrich Kurz, 2005 .

Highly selective HBr etch process for fabrication of triple-gate nano-scale SOI-MOSFETs

J. K. Efavi, Max C. Lemme, Heinrich Kurz, 2004 .

CMOS integration of epitaxial Gd2O3 high-k gate dielectrics

J. K. Efavi, Max C. Lemme, Michael Schmidt, 2006 .