Y. Kawasuji

Key components technology update of the 250W high-power LPP-EUV light source

Tamotsu Abe, Hiroshi Tanaka, Hiroaki Nakarai, 2017, Advanced Lithography.

Performance of one hundred watt HVM LPP-EUV source

Georg Soumagne, Tsuyoshi Yamada, Tamotsu Abe, 2015, Advanced Lithography.

Deep ultraviolet excimer laser processing for the micro via hole on semiconductor package

H. Mizoguchi, J. Fujimoto, A. Suwa, 2020 .

Optical performance of laser light source for ArF immersion double patterning lithography tool

Satoshi Tanaka, Takahito Kumazaki, Junichi Fujimoto, 2009, Advanced Lithography.

Development of high-power ArF/F2 laser platform for VUV microlithography

Tatsuya Ariga, Hakaru Mizoguchi, Akira Sumitani, 2004, SPIE Advanced Lithography.

QCL seeded, ns-pulse, multi-line, CO2 laser oscillator for laser-produced-plasma extreme-UV source

Akira Endo, Hakaru Mizoguchi, Akira Sumitani, 2017, International Symposium on High Power Laser Systems and Applications.