Bryan M. Barnes

发表

Dimensional measurement sensitivity analysis for a MoSi photomask using DUV reflection scatterfield imaging microscopy

Martin Y. Sohn, Dong Ryoung Lee, Bryan M. Barnes, 2017, Photomask Technology.

Evaluating the effects of modeling errors for isolated finite 3D targets

Hui Zhou, Bryan M. Barnes, Mark-Alexander Henn, 2017, Advanced Lithography.

Optimizing hybrid metrology: rigorous implementation of Bayesian and combined regression

Hui Zhou, Bryan M. Barnes, Nien Fan Zhang, 2015, Advanced Lithography.

Contrasting conventional and machine learning approaches to optical critical dimension measurements

Bryan M. Barnes, Mark-Alexander Henn, B. Barnes, 2020, Advanced Lithography.

The limits of image-based optical metrology

Egon Marx, Heather Patrick, Bryan M. Barnes, 2006, SPIE Advanced Lithography.

Applications of machine learning at the limits of form-dependent scattering for defect metrology

Bryan M. Barnes, Mark-Alexander Henn, Hui Zhou, 2019, Advanced Lithography.

Phase sensitive parametric optical metrology: exploring the limits of three-dimensional optical metrology

Jing Qin, Bryan M. Barnes, Ronald G. Dixson, 2012, Advanced Lithography.

Use of Bayesian Statistics to Improve Optical Measurement Uncertainty by Combined Multi-Tool Metrology

Hui Zhou, Bryan M. Barnes, Richard M. Silver, 2015 .

Evaluating the effects of modeling errors for isolated finite three-dimensional targets

Hui Zhou, Bryan M. Barnes, Mark-Alexander Henn, 2017 .

Intersecting the Quantum Future and the Semiconductor Industry (Conference Presentation)

Bryan M. Barnes, R. Joseph Kline, Erik R. Hosler, 2020 .

Sub-50-nm measurements using a 193-nm angle-resolved scatterfield microscope

Bryan M. Barnes, Richard M. Silver, R. Quintanilha, 2010, Advanced Lithography.

Nested uncertainties and hybrid metrology to improve measurement accuracy

Hui Zhou, Jing Qin, Bryan M. Barnes, 2011, Advanced Lithography.

Critical dimension measurements using a 193 nm scatterfield microscope

Bryan M. Barnes, Richard M. Silver, R. Quintanilha, 2009, Optical Metrology.

The effect of systematic errors on the hybridization of optical critical dimension measurements

Bryan M. Barnes, Richard M. Silver, Nien Fan Zhang, 2015, Optical Metrology.

SCATTERFIELD MICROSCOPY, REVIEW OF TECHNIQUES THAT PUSH THE FUNDAMENTAL LIMITS OF OPTICAL DEFECT METROLOGY | NIST

Martin Y. Sohn, Bryan M. Barnes, Richard M. Silver, 2013 .

Harnessing 3D Scattered Optical Fields for sub-20 nm Defect Detection

Martin Y. Sohn, Bryan M. Barnes, Richard M. Silver, 2013 .

193 nm angle-resolved scatterfield microscope for semiconductor metrology

Bryan M. Barnes, Richard M. Silver, Yeung Joon Sohn, 2009, NanoScience + Engineering.

A Library to Enable the Modeling of Optical Imaging of Finite Multi-Line Arrays.

Bryan M. Barnes, Mark-Alexander Henn, 2016 .

The Limits of Image-Based Optical Metrology | NIST

Bryan M. Barnes, Ronald G. Dixson, Richard M. Silver, 2006 .

Scatterfield microscopy using back focal plane imaging with an engineered illumination field

Heather Patrick, Bryan M. Barnes, Richard M. Silver, 2006, SPIE Advanced Lithography.

Multiple-order imaging for optical critical dimension metrology using microscope characterization

Hui Zhou, Jing Qin, Bryan M. Barnes, 2012, Other Conferences.

The limits and extensibility of optical patterned defect inspection

Bryan M. Barnes, Richard M. Silver, Hui Zhou, 2010, Advanced Lithography.

Optical through-focus technique that differentiates small changes in line width, line height, and sidewall angle for CD, overlay, and defect metrology applications

Bryan M. Barnes, Richard M. Silver, Ravikiran Attota, 2008, SPIE Advanced Lithography.

Supplementing rigorous electromagnetic modeling with atomistic simulations for optics-based metrology

Bryan M. Barnes, Richard M. Silver, Mark-Alexander Henn, 2019, Optical Metrology.

Illumination optimization for optical semiconductor metrology

Bryan M. Barnes, Richard M. Silver, Lowell P. Howard, 2006, SPIE Optics + Photonics.

Quantitative tool characterization of 193nm scatterfield microscope

Martin Y. Sohn, Bryan M. Barnes, Richard M. Silver, 2015, SPIE NanoScience + Engineering.

Quantitative microscope characterization for optical measurements with sub-nm parametric uncertainties

Jing Qin, Bryan M. Barnes, Richard M. Silver, 2013, Optics & Photonics - NanoScience + Engineering.

USE OF A BAYESIAN APPROACH TO IMPROVE UNCERTAINTY OF MODEL-BASED MEASUREMENTS BY HYBRID MULTI-TOOL METROLOGY

Hui Zhou, Bryan M. Barnes, Nien Fan Zhang, 2015 .

Surface and interface roughness in magnetic thin films: a comparison using carbon-nanotube atomic force microscopy and soft-x-ray scattering

Bryan M. Barnes, Max G. Lagally, Frank S. Flack, 2002, SPIE Optics + Photonics.

Data-driven approaches to optical patterned defect detection.

Bryan M. Barnes, Hui Zhou, Mark-Alexander Henn, 2019, OSA continuum.

Fundamental limits of optical critical dimension metrology: a simulation study

Egon Marx, Bryan M. Barnes, Benjamin Bunday, 2007, SPIE Advanced Lithography.

Assessing the wavelength extensibility of optical patterned defect inspection

Martin Y. Sohn, Bryan M. Barnes, Mark-Alexander Henn, 2017, Advanced Lithography.

Enhancing 9 nm node dense patterned defect optical inspection using polarization, angle, and focus

Martin Y. Sohn, Bryan M. Barnes, Richard M. Silver, 2013, Advanced Lithography.

Angle-resolved optical metrology using multi-technique nested uncertainties

Hui Zhou, Bryan M. Barnes, Ronald G. Dixson, 2009, Optical Metrology.

Appraising the extensibility of optics-based metrology for emerging materials

Hui Zhou, Martin Y. Sohn, Bryan M. Barnes, 2019 .

Optimizing image-based patterned defect inspection through FDTD simulations at multiple ultraviolet wavelengths

Martin Y. Sohn, Bryan M. Barnes, Richard M. Silver, 2017, Optical Metrology.

Assessing Quantitative Optical Imaging for Realizing In-die Critical Dimension Metrology | NIST

Hui Zhou, Martin Y. Sohn, Bryan M. Barnes, 2017 .

Optical illumination optimization for patterned defect inspection

Bryan M. Barnes, Richard M. Silver, Hui Zhou, 2011, Advanced Lithography.

3-D Optical Metrology of Finite sub-20 nm Dense Arrays using Fourier Domain Normalization | NIST

Hui Zhou, Jing Qin, Bryan M. Barnes, 2013 .

Scatterfield microscopy of 22-nm node patterned defects using visible and DUV light

Bryan M. Barnes, Richard M. Silver, Hui Zhou, 2012, Advanced Lithography.

Zero-order imaging of device-sized overlay targets using scatterfield microscopy

Bryan M. Barnes, Richard M. Silver, Pete Lipscomb, 2007, SPIE Advanced Lithography.

Improving optical measurement accuracy using multi-technique nested uncertainties

Hui Zhou, Bryan M. Barnes, Ronald G. Dixson, 2009, Advanced Lithography.

Improving data-driven OCD uncertainties from Gaussian process regression

Bryan M. Barnes, Mark-Alexander Henn, 2021 .

Extensibility of optics-based metrology for sub-5nm technology (Conference Presentation)

Martin Y. Sohn, Bryan M. Barnes, Richard M. Silver, 2018 .

Zero‐Order and Super‐Resolved Imaging of Arrayed Nanoscale Lines using Scatterfield Microscopy

Bryan M. Barnes, Richard M. Silver, Pete Lipscomb, 2007 .

Combining model-based measurement results of critical dimensions from multiple tools

Bryan M. Barnes, Richard M. Silver, Nien Fan Zhang, 2017 .

Characterizing a scatterfield optical platform for semiconductor metrology

Bryan M. Barnes, Richard M. Silver, Yeung Joon Sohn, 2011 .

Optical critical dimension measurement of silicon grating targets using back focal plane scatterfield microscopy

Heather Patrick, Bryan M. Barnes, Ronald G. Dixson, 2008 .

Spectroscopic Scatterfield Microscopy

Bryan M. Barnes, Richard M. Silver, Hui Zhou, 2009 .