Richard M. Silver

发表

Dimensional measurement sensitivity analysis for a MoSi photomask using DUV reflection scatterfield imaging microscopy

Martin Y. Sohn, Dong Ryoung Lee, Bryan M. Barnes, 2017, Photomask Technology.

Analysis of Köhler illumination for 193 nm scatterfield microscope

Richard M. Silver, Lowell P. Howard, Yeung Joon Sohn, 2009, Advanced Lithography.

The limits of image-based optical metrology

Egon Marx, Heather Patrick, Bryan M. Barnes, 2006, SPIE Advanced Lithography.

Optical Overlay Metrology at NIST | NIST

James E. Potzick, Richard M. Silver, Amy Singer, 1996 .

Phase sensitive parametric optical metrology: exploring the limits of three-dimensional optical metrology

Jing Qin, Bryan M. Barnes, Ronald G. Dixson, 2012, Advanced Lithography.

Two-dimensional calibration artifact and measurement methodology

Richard M. Silver, Theodore D. Doiron, Michael T. Takac, 1999, Advanced Lithography.

Sub-50-nm measurements using a 193-nm angle-resolved scatterfield microscope

Bryan M. Barnes, Richard M. Silver, R. Quintanilha, 2010, Advanced Lithography.

Developing an uncertainty analysis for optical scatterometry

Heather Patrick, Richard M. Silver, Benjamin Bunday, 2009, Advanced Lithography.

On CD-AFM bias related to probe bending

Ndubuisi G. Orji, Ronald G. Dixson, Richard M. Silver, 2012, Advanced Lithography.

Scatterfield microscopy using conventional and back focal plane imaging with an engineered illumination field, ed. by C.N. Archie

Heather Patrick, Richard M. Silver, Ravi Kiran Attota, 2006 .

193 nm scatterfield microscope illumination optics

Martin Y. Sohn, Richard M. Silver, 2014, Other Conferences.

Critical dimension measurements using a 193 nm scatterfield microscope

Bryan M. Barnes, Richard M. Silver, R. Quintanilha, 2009, Optical Metrology.

High-resolution optical overlay metrology

Egon Marx, Mark P. Davidson, Richard M. Silver, 2004, SPIE Advanced Lithography.

The effect of systematic errors on the hybridization of optical critical dimension measurements

Bryan M. Barnes, Richard M. Silver, Nien Fan Zhang, 2015, Optical Metrology.

SCATTERFIELD MICROSCOPY, REVIEW OF TECHNIQUES THAT PUSH THE FUNDAMENTAL LIMITS OF OPTICAL DEFECT METROLOGY | NIST

Martin Y. Sohn, Bryan M. Barnes, Richard M. Silver, 2013 .

Effects of etching time and wafer miscut on the morphology of etched Si(111) surfaces

Richard M. Silver, Hui Zhou, Joseph Fu, 2002, Workshop on Nanostructure Science, Metrology, and Technology.

Harnessing 3D Scattered Optical Fields for sub-20 nm Defect Detection

Martin Y. Sohn, Bryan M. Barnes, Richard M. Silver, 2013 .

193 nm angle-resolved scatterfield microscope for semiconductor metrology

Bryan M. Barnes, Richard M. Silver, Yeung Joon Sohn, 2009, NanoScience + Engineering.

The Limits of Image-Based Optical Metrology | NIST

Bryan M. Barnes, Ronald G. Dixson, Richard M. Silver, 2006 .

New design and uncertainty budget for a metrology UHV-STM used in direct measurements of atom spacings

Richard M. Silver, Hui Zhou, Satoshi Gonda, 2002, Workshop on Nanostructure Science, Metrology, and Technology.

Scatterfield microscopy using back focal plane imaging with an engineered illumination field

Heather Patrick, Bryan M. Barnes, Richard M. Silver, 2006, SPIE Advanced Lithography.

Köhler illumination for high-resolution optical metrology

Richard M. Silver, Lowell P. Howard, Yeung Joon Sohn, 2006, SPIE Advanced Lithography.

Comparison of measured optical image profiles of silicon lines with two different theoretical models

Egon Marx, Mark P. Davidson, Richard M. Silver, 2002, SPIE Advanced Lithography.

Photomask Metrology, Photomask Fabrication Technology | NIST

Richard M. Silver, Andras Vladar, 2005 .

The limits and extensibility of optical patterned defect inspection

Bryan M. Barnes, Richard M. Silver, Hui Zhou, 2010, Advanced Lithography.

Supplementing rigorous electromagnetic modeling with atomistic simulations for optics-based metrology

Bryan M. Barnes, Richard M. Silver, Mark-Alexander Henn, 2019, Optical Metrology.

Illumination optimization for optical semiconductor metrology

Bryan M. Barnes, Richard M. Silver, Lowell P. Howard, 2006, SPIE Optics + Photonics.

Distributed force probe bending model of critical dimension atomic force microscopy bias

Ndubuisi G. Orji, Ronald G. Dixson, Richard M. Silver, 2013 .

Overlay metrology simulations: analytical and experimental validations

Richard M. Silver, Joel L. Seligson, Jorge M. Poplawski, 2003, SPIE Advanced Lithography.

Quantitative tool characterization of 193nm scatterfield microscope

Martin Y. Sohn, Bryan M. Barnes, Richard M. Silver, 2015, SPIE NanoScience + Engineering.

Characterization of CCD cameras and optics for dimensional metrology

Richard M. Silver, Edward Kornegay, S. Fox, 2001 .

Quantitative microscope characterization for optical measurements with sub-nm parametric uncertainties

Jing Qin, Bryan M. Barnes, Richard M. Silver, 2013, Optics & Photonics - NanoScience + Engineering.

Metrology with the ultraviolet scanning transmission microscope

Richard M. Silver, James E. Potzick, J. Y-Chien Hu, 1995, Advanced Lithography.

Enhancing 9 nm node dense patterned defect optical inspection using polarization, angle, and focus

Martin Y. Sohn, Bryan M. Barnes, Richard M. Silver, 2013, Advanced Lithography.

Calibrated Overlay Wafer Standard | NIST

Richard M. Silver, Michael T. Stocker, Ravikiran Attota, 2007 .

Calibrating optical overlay measurements

Richard M. Silver, Benjamin Bunday, Ravi Kiran Attota, 2006, SPIE Advanced Lithography.

Optimizing image-based patterned defect inspection through FDTD simulations at multiple ultraviolet wavelengths

Martin Y. Sohn, Bryan M. Barnes, Richard M. Silver, 2017, Optical Metrology.

Köhler illumination analysis for high-resolution optical metrology using 193 nm light

Richard M. Silver, Yeung-Joon Sohn, 2007, SPIE Advanced Lithography.

Optical illumination optimization for patterned defect inspection

Bryan M. Barnes, Richard M. Silver, Hui Zhou, 2011, Advanced Lithography.

Benchmarking the Length Measurement Capabilities of the National Institute of Standards and Technology | NIST

Michael T. Postek, James E. Potzick, Ronald G. Dixson, 1998 .

Scatterfield microscopy of 22-nm node patterned defects using visible and DUV light

Bryan M. Barnes, Richard M. Silver, Hui Zhou, 2012, Advanced Lithography.

Zero-order imaging of device-sized overlay targets using scatterfield microscopy

Bryan M. Barnes, Richard M. Silver, Pete Lipscomb, 2007, SPIE Advanced Lithography.

Improving the uncertainty of photomask linewidth measurements

James E. Potzick, Richard M. Silver, J. Marc Pedulla, 2004, SPIE Advanced Lithography.

Application of through-focus focus-metric analysis in high resolution optical metrology

Richard M. Silver, Robert D. Larrabee, Michael Bishop, 2005, SPIE Advanced Lithography.

High-accuracy overlay measurements

James E. Potzick, Richard M. Silver, Robert D. Larrabee, 1996, Advanced Lithography.

Extensibility of optics-based metrology for sub-5nm technology (Conference Presentation)

Martin Y. Sohn, Bryan M. Barnes, Richard M. Silver, 2018 .

Zero‐Order and Super‐Resolved Imaging of Arrayed Nanoscale Lines using Scatterfield Microscopy

Bryan M. Barnes, Richard M. Silver, Pete Lipscomb, 2007 .

Topography Measurements and Performance Comparisons between NIST SRM 2460 Standard Bullet Masters and BKA Bullet Replicas | NIST

Richard M. Silver, Jun-Feng Song, Theodore V. Vorburger, 2012 .

Nanometrology using a through-focus scanning optical microscopy method

Richard M. Silver, Ravikiran Attota, 2011 .

Combining model-based measurement results of critical dimensions from multiple tools

Bryan M. Barnes, Richard M. Silver, Nien Fan Zhang, 2017 .

Pattern transfer of hydrogen depassivation lithography patterns into silicon with atomically traceable placement and size control

Kai Li, Robert M. Wallace, Richard M. Silver, 2014 .

National Nanotechnology Initiative Interagency Workshop on Instrumentation and Metrology for Nanotechnology Grand Challenge Report | NIST

Michael T. Postek, Richard R. Cavanagh, Richard M. Silver, 2006 .

Height Calibration of Atomic Force Microscopes Using Silicon Atomic Step Artifacts | NIST

Ronald G. Dixson, Richard M. Silver, Theodore V. Vorburger, 1996 .

Characterizing a scatterfield optical platform for semiconductor metrology

Bryan M. Barnes, Richard M. Silver, Yeung Joon Sohn, 2011 .

Enhanced model for scanning tunneling microscope tip geometry measured with field ion microscopy

Carsten P. Jensen, Richard M. Silver, P. V. Rao, 2004 .

Atomic-resolution measurements with a new tunable diode laser-based interferometer

Carsten P. Jensen, Satoshi Gonda, Richard M. Silver, 2004 .

Light Scattering Methods

Richard M. Silver, Theodore V. Vorburger, Boris Brodmann, 2011 .

Distributed Force Probe Bending Model of CD-AFM Bias | NIST

Ndubuisi G. Orji, Ronald G. Dixson, Richard M. Silver, 2013 .

Optical critical dimension measurement of silicon grating targets using back focal plane scatterfield microscopy

Heather Patrick, Bryan M. Barnes, Ronald G. Dixson, 2008 .

Nanoscale Measurements with a Through-Focus Scanning-Optical-Microscope | NIST

Richard M. Silver, Thomas A. Germer, Ravikiran Attota, 2009 .

Damping mechanisms for precision applications in UHV environment | NIST

Richard M. Silver, R. Ryan Vallance, Bradley N. Damazo, 2006 .

Spectroscopic Scatterfield Microscopy

Bryan M. Barnes, Richard M. Silver, Hui Zhou, 2009 .

Time-resolved kinetic monte-carlo simulation study on Si (111) etching

Richard M. Silver, Hui Zhou, Joseph Fu, 2007 .

NIST SURFACE ROUGHNESS AND STEP HEIGHT CALIBRATIONS, Measurement Conditions and Sources of Uncertainty | NIST

Richard M. Silver, Jun-Feng Song, Theodore V. Vorburger, 2014 .

Dependence of morphology on miscut angle for Si(111) etched in NH4F

Satoshi Gonda, Richard M. Silver, Hui Zhou, 2003 .