Thiloma Perera

Study Of The Reaction Kinetics Of The Photoresist Aging Process

Thiloma Perera, Michael P. C. Watts, 1988, Advanced Lithography.

G-line image reversal: capabilities on a 0.54-N.A. stepper

Thiloma Perera, Thomas R. Seha, 1990, Advanced Lithography.

Evaluation of a photoresist process for 0.75-micron g-line lithography

Mircea V. Dusa, Thiloma Perera, Jack S. Kasahara, 1991, Other Conferences.