V. Reboud

Ultra-high amplified strain on 200 mm optical Germanium-On-Insulator (GeOI) substrates: towards CMOS compatible Ge lasers

D. Fowler, J. M. Hartmann, J. Widiez, 2016, SPIE OPTO.

High-quality and homogeneous 200-mm GeOI wafers processed for high strain induction in Ge

J. Rothman, J. Widiez, F. Rieutord, 2017, OPTO.