Ryo Nakayama

Improvement of lithographic performance and reduction of mask cost by simple OPC

Hidetami Yaegashi, Kenichi Oyama, Valery Axelrad, 2012, Photomask Technology.

7nm logic optical lithography with OPC-Lite

Hidetami Yaegashi, Kenichi Oyama, Valery Axelrad, 2015, Advanced Lithography.

Pitch-based pattern splitting for 1D layout

Hidetami Yaegashi, Kenichi Oyama, Valery Axelrad, 2015, Other Conferences.

Innovative pattern matching method considering process margin and scanner design information

Kazuhiro Takahashi, Mikio Arakawa, Koichiro Tsujita, 2009, Advanced Lithography.