R. Mann

Effects of various RIE process-induced damages on MOSFET characteristics

Dim-Lee Kwong, B. W. Min, Atul Joshi, 1995, Advanced Lithography.

Models for low resolution slit scan measurements based on high resolution laser scanning image analysis: DNA and nuclear dimensions

R. Mann, W. Heinze, P. F. Mullaney, 1981, Pattern Recognit..

Large-scale Electrical Tomography Sensing System to Study Mixing Phenomena

Tomasz Dyakowski, Mi Wang, F. J. Dickin, 1996 .

Impact of process-induced damage on MOSFET reliability and suppression of damage by the use of NO-based oxynitride gate dielectrics

R. Mann, D.L. Kwong, M. Bhat, 1995, 1995 International Symposium on VLSI Technology, Systems, and Applications. Proceedings of Technical Papers.

Suppressed Process-Induced Damage in N2O-annealed SiO2 Gate Dielectrics

Dim-Lee Kwong, T. H. Cho, B. W. Min, 1995 .