Oleg B. Khristoforov

Prospects for high-power high-repetition-rate industrial excimer lasers

Vladimir M. Borisov, Oleg B. Khristoforov, Yurii B. Kirykhin, 2001, International Symposium on High Power Laser Systems and Applications.

Development of high-power EUV sources for lithography

Vladimir M. Borisov, Guido Schriever, Juergen Kleinschmidt, 2002, SPIE Advanced Lithography.

Discharge produced plasma source for EUV lithography

Vladimir M. Borisov, Oleg B. Khristoforov, Yurii B. Kirykhin, 2007, Laser Optics.

Compact Z-pinch EUV source for photolithography

Uwe Stamm, Dirk Basting, Vladimir M. Borisov, 2001, SPIE Advanced Lithography.

High-average-power excimer lasers

Uwe Stamm, Dirk Basting, Vladimir M. Borisov, 1998, International Symposium on High Power Laser Systems and Applications.

Recent advances in the development of coherent and incoherent UV and EUV discharge sources

Vladimir M. Borisov, Oleg B. Khristoforov, Andrei I. Demin, 2004, Laser Optics.

Development of next generation excimer lasers for industrial applications

Vladimir M. Borisov, Oleg B. Khristoforov, Andrei I. Demin, 2003, Other Conferences.

Theoretical and experimental investigations of the 1-kW XeCl laser with UV pre-ionization

Vladimir M. Borisov, Oleg B. Khristoforov, Yurii B. Kirykhin, 1997, Photonics West.

Development of Linear Sequential Lateral Solidification Technique to Fabricate Quasi-Single-Crystal Super-Thin Si Films for High-Performance Thin Film Transistor Devices

Vladimir M. Borisov, Oleg B. Khristoforov, Andrei I. Demin, 2000 .

Kilowatt-range high-repetition-rate excimer lasers

Vladimir M. Borisov, Oleg B. Khristoforov, Yurii B. Kirykhin, 1991 .

EUV sources using Xe and Sn discharge plasmas

Vladimir M. Borisov, A. S. Ivanov, Oleg B. Khristoforov, 2004 .