Brad Falch

Automated OPC model collection, cleaning, and calibration flow

Brian Ward, Martin Drapeau, Brad Falch, 2008, Photomask Technology.

A new etch-aware after development inspection (ADI) technique for OPC modeling

Aram Kazarian, Brad Falch, Jason Huang, 2010, Advanced Lithography.

Robust approach to determine the optimized illumination condition using process window analysis

Han-Ku Cho, Yong-Jin Chun, Sung-Woo Lee, 2007, Photomask Japan.

Resist development modeling for OPC accuracy improvement

Lawrence S. Melvin, Kevin Lucas, Brian Ward, 2009, Advanced Lithography.

A simplified reaction-diffusion system of chemically amplified resist process modeling for OPC

Thomas Schmoeller, Sung-Woo Lee, Yongfa Fan, 2010, Advanced Lithography.

The calibration of process window model for 55-nm node

Sheng Yuan Huang, Te Hung Wu, Chia Wei Huang, 2007, SPIE Advanced Lithography.

Process variation aware OPC modeling for leading edge technology nodes

Kevin Lucas, Ebo Croffie, Yongfa Fan, 2009, Advanced Lithography.