J. Paufler

In-chip overlay metrology in 90 nm production

R. Seltmann, B. Schulz, J. Paufler, 2005, ISSM 2005, IEEE International Symposium on Semiconductor Manufacturing, 2005..

High-throughput optical direct write lithography

Wolfgang Doleschal, Andreas Gehner, R. Seltmann, 1997 .