Arun Ramamoorthy

Vendor capability for low-thermal-expansion mask substrates for EUV lithography

Scott Daniel Hector, Pei-Yang Yan, John S. Taylor, 2002, SPIE Advanced Lithography.

Impact of surface contamination on transmittance of modified fused silica for 157-nm lithography application

Giang T. Dao, Fu-Chang Lo, Arun Ramamoorthy, 2001, SPIE Photomask Technology.

A Scalable High Throughput Firewall in FPGA

Kuruvilla Varghese, Arun Ramamoorthy, Gajanan S. Jedhe, 2008, 2008 16th International Symposium on Field-Programmable Custom Computing Machines.

Investigation of thermophoretic protection with speed Investigation of thermophoretic protection with speed- - controlled particles at 100

Kevin J. Orvek, Christof Asbach, Se-Jin Yook, 2005 .

Laser Shock Removal of Nanoparticles from Si Capping Layer of Extreme Ultraviolet Lithography Masks

Guojing Zhang, Ahmed Busnaina, Florence Eschbach, 2005 .

Protection schemes for critical surface in vacuum environments

David Y. H. Pui, Kevin J. Orvek, Christof Asbach, 2005 .