Yasa Sampurno

Performance of a Novel Slurry Injection System on an Ebara F-REX200 Polisher for a Silicon Dioxide CMP Application

Yun Zhuang, Leonard Borucki, Yasa Sampurno, 2012 .

Pattern evolution studies in STI CMP via real-time shear and down force spectral analyses

Yun Zhuang, Yasa Sampurno, Ara Philipossian, 2008 .

Effect of pad groove width on slurry mean residence time and slurry utilization efficiency in CMP

Yun Zhuang, Yasa Sampurno, Ara Philipossian, 2016 .

End-Point Detection of Ta/TaN Chemical Mechanical Planarization via Forces Analysis

Tadahiro Ohmi, Akinobu Teramoto, Yun Zhuang, 2010 .