Ikboum Hur

Fundamental analysis on fabrication of 256-MB DRAM using phase-shift mask technology

Soo-Han Choi, Young-Mog Ham, Hung-Eil Kim, 1994, Advanced Lithography.

ICP (inductively coupled plasma) dry etch of DUV MoSi HTPSM

Kyung-Han Nam, Lee-Ju Kim, Kyu-Yong Lee, 1999, Photomask and Next Generation Lithography Mask Technology.

Effect of pattern density for contact windows in an attenuated phase shift mask

Ki-Ho Baik, Chang-Nam Ahn, Il-Ho Lee, 1995, Advanced Lithography.

Accurate overlay control for 0.30-um i-line lithography

Soo-Han Choi, KeunYoung Kim, Ikboum Hur, 1996, Advanced Lithography.

TiSi-nitride-based attenuated phase-shift mask for ArF lithography

Ki-Ho Baik, Chul Shin, Lee-Ju Kim, 1999, Photomask Technology.

Study of optical proximity effects using off-axis illumination with attenuated phase shift mask

Ki-Ho Baik, Chang-Nam Ahn, Yong-Suk Lee, 1995, Advanced Lithography.

Implementation of i-line lithography to 0.30 um design rules

Jin-Soo Kim, Ki-Ho Baik, Seung-Chan Moon, 1995, Advanced Lithography.

Comparison study of mask error effects for various mask-making processes

Chul Shin, Tae-Seung Eom, Ikboum Hur, 1999, Photomask Technology.

Overlay and lens distortion in a modified illumination stepper

Jeong Soo Kim, Soo-Han Choi, Young-Mog Ham, 1994, Advanced Lithography.