James Werking

Electrical characterization of FSG low K dielectric deposition in HDP and PECVD tools

Gennadi Bersuker, Michael J. Shapiro, Sang U. Kim, 1997, Advanced Lithography.

uced Charging Damage In Thin Gate Oxides

Gennadi Bersuker, David Y. Chan, James Werking, 1997 .

Cyclic I-V and Q-V: new measurement techniques for monitoring processes and processing-induced damage

Murat Okandan, Stephen J. Fonash, James Werking, 1997, Advanced Lithography.

Technique for reducing the Ätzschadens during the manufacture of vias and trenches in interlayer

James Werking, Massud Aminpur, Matthias Schaller, 2005 .

Methane/hydrogen‐based reactive ion etching of InAs, InP, GaAs, and GaSb

Herbert Kroemer, Evelyn L. Hu, Chanh Nguyen, 1991 .