韦亚一

发表

Analysis of mix-and-match litho approach for manufacturing

赵超, 叶甜春, 韦亚一, 2014 .

Focus Shift Impacted by Mask 3D And Comparison between Att. PSM and OMOG

董立松, 韦亚一, 刘艳松, 2015 .

Enlage the process window of patterns in 22nm node by using mask topography aware OPC and SMO

董立松, 韦亚一, 刘艳松, 2015 .

Efficient source mask optimization method for reduction of computational lithography cycles and enhancement of process-window predictability

韦亚一, 宋之洋, 郭沫然, 2015 .

EUV design rule, light source and mask joint optimization method and imaging modeling method

韦亚一, 宋之洋, 郭沫然, 2016 .

Photolithography solution prediction method based on layout geometric feature matching

董立松, 韦亚一, 苏晓菁, 2016 .

Necessity of resist model in source mask optimization for negative tone development process

陈文辉, 叶甜春, 董立松, 2017 .