Chang-Min Park

Performance Analysis and Optimum Beam Combination for Vertical Sectorization in LTE Systems

Duk Kyung Kim, Gyu Seong Cho, Pan-Kyu Suh, 2014 .

Mask characterization for critical dimension uniformity budget breakdown in advanced extreme ultraviolet lithography

Shawn Lee, Insung Kim, Greg Yang, 2013 .

Patterning with EUVL: the road to 22nm node

Han-Ku Cho, Hyun-Woo Kim, Chang-Min Park, 2010, Advanced Lithography.

Availability of underlayer application to EUV process

Carlos Fonseca, Hyun-Woo Kim, Cha-Won Koh, 2011, Advanced Lithography.

Prospects of DUV OoB suppression techniques in EUV lithography

Insung Kim, Jeong-Ho Yeo, Hyun-Woo Kim, 2014, Advanced Lithography.

Characteristics of residues and optical change of HT PSM during stepwise wet cleaning and optimization of HT PSM cleaning process

Sang-Soo Choi, Jin-Min Kim, Dong-Heok Lee, 2002, Photomask Japan.

Design and Fabrication of On-Chip Coupled Inductors Integrated With Magnetic Material for Voltage Regulators

Chang-Min Park, J. T. DiBene, Chang-min Park, 2011, IEEE Transactions on Magnetics.