Brent Riggs

Integrated production overlay field-by-field control for leading edge technology nodes

Chen Li, Young Ki Kim, John C. Robinson, 2014, Advanced Lithography.

CPE run-to-run overlay control for High Volume Manufacturing

John C. Robinson, Christian Sparka, Bill Pierson, 2015, 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).

Run time scanner data analysis for HVM lithography process monitoring and stability control

Chen Li, Young Ki Kim, Jeong Soo Kim, 2014, Advanced Lithography.

HVM capabilities of CPE run-to-run overlay control

John C. Robinson, Karsten Gutjahr, Christian Sparka, 2015, Advanced Lithography.