Sascha Brose

发表

Achromatic Talbot lithography with partially coherent extreme ultraviolet radiation: process window analysis

Peter Loosen, Larissa Juschkin, Sascha Brose, 2016 .

EUV-LET 2.0: a compact exposure tool for industrial research at a wavelength of 13.5nm

Peter Loosen, Larissa Juschkin, Sascha Brose, 2019, Advanced Lithography.

Spectroscopic reflectometry in the extreme ultraviolet for critical dimension metrology

Jochen Stollenwerk, Peter Loosen, Robert Michels, 2019, Advanced Lithography.

Characterization of pellicle membranes by lab-based spectroscopic reflectance and transmittance measurements in the extreme ultraviolet

Jochen Stollenwerk, Peter Loosen, Ivan Pollentier, 2017, Photomask Technology.

Accuracy analysis of a stand-alone EUV spectrometer for the characterization of ultrathin films and nanoscale gratings

Peter Loosen, Sascha Brose, Serhiy Danylyuk, 2020, Photomask Technology.

Industrial photoresist development with the EUV laboratory exposure tool: mask fabrication, sensitivity and contrast

Peter Loosen, Sascha Brose, Serhiy Danylyuk, 2019, Photomask Technology.

Enabling laboratory EUV research with a compact exposure tool

Peter Loosen, Larissa Juschkin, Sascha Brose, 2016, SPIE Advanced Lithography.

Laboratory-based EUV spectroscopy for the characterization of thin films, membranes and nanostructured surfaces

Peter Loosen, Sascha Brose, Serhiy Danylyuk, 2019, Photomask Technology.

Tabletop coherent diffraction imaging with a discharge plasma EUV source

Rui Xu, Larissa Juschkin, Sascha Brose, 2013, Optics & Photonics - Optical Engineering + Applications.

Optimized phase-shifting masks for high-resolution resist patterning by interference lithography

Peter Loosen, Larissa Juschkin, Sascha Brose, 2017, Photomask Technology.

Nanoscale grating characterization through EUV spectroscopy aided by machine learning techniques

Peter Loosen, Sascha Brose, Serhiy Danylyuk, 2020, Advanced Lithography.

EUV scattering from carbon nanotube pellicles: measurement and control

Marina Y. Timmermans, Cedric Huyghebaert, Sascha Brose, 2021 .

EUV scattering from CNT pellicles: measurement and control

Marina Y. Timmermans, Cedric Huyghebaert, Sascha Brose, 2021, Advanced Lithography.

Broadband scatterometry at extreme ultraviolet wavelengths for nanograting characterization

Jochen Stollenwerk, Peter Loosen, Larissa Juschkin, 2021, Advanced Lithography.

Latent image characterization by spectroscopic reflectometry in the extreme ultraviolet

Jochen Stollenwerk, Peter Loosen, Sascha Brose, 2021, Advanced Lithography.

Deposition and characterization of B4C/CeO2 multilayers at 6.x nm extreme ultraviolet wavelengths

Piergiorgio Nicolosi, Larissa Juschkin, Sascha Brose, 2016 .

Extreme ultraviolet proximity lithography for fast, flexible and parallel fabrication of infrared antennas.

Larissa Juschkin, Thomas Taubner, Sascha Brose, 2015, Optics express.

Broadband transmission masks, gratings and filters for extreme ultraviolet and soft X-ray lithography

Peter Loosen, Larissa Juschkin, Sascha Brose, 2012 .

Characterization of nanoscale gratings by spectroscopic reflectometry in the extreme ultraviolet with a stand-alone setup.

Jochen Stollenwerk, Peter Loosen, Sascha Brose, 2020, Optics express.