William K. Bell

Planarizing material for reverse-tone step and flash imprint lithography

Ryan Deschner, C. Grant Willson, Satoshi Takei, 2014 .

High aspect ratio patterning of photosensitive polyimide with low thermal expansion coefficient and low dielectric constant

Paul A. Kohl, William K. Bell, Andrew R. Dick, 2016 .

Planarizing material for reverse-tone step and flash imprint lithography

Ryan Deschner, C. Grant Willson, Satoshi Takei, 2010, Advanced Lithography.

Reactive fluorinated surfactant for step and flash imprint lithography

C. Grant Willson, Tsuyoshi Ogawa, Michael W. Lin, 2013 .

Directly patternable dielectric based on fluorinated polyimide

C. Grant Willson, Paul A. Kohl, William K. Bell, 2015, Advanced Lithography.

JSS FOCUS ISSUE ON ADVANCED INTERCONNECTS :M ATERIALS ,P ROCESSING, AND RELIABILITY Chemically Amplified, Positive Tone, Polynorbornene Dielectric for Microelectronics Packaging

C. Grant Willson, Paul A. Kohl, William K. Bell, 2015 .