Janet M. Rocque

SNR200 chemically amplified resist optimization

William Chu, Douglas J. Resnick, Kevin D. Cummings, 1997, Advanced Lithography.

UVIII-positive chemically amplified resist optimization

Pawitter J. S. Mangat, Cameron J. Brooks, Douglas E. Benoit, 1998, Advanced Lithography.

X-ray mask image-placement studies at the Microlithography Mask Development Center

Kurt R. Kimmel, Douglas E. Benoit, Mark Lawliss, 1996, Advanced Lithography.

Chemically amplified negative resist for e-beam fabrication of x-ray masks

Donald K. Bailey, Ranee W. Kwong, Ahmad D. Katnani, 1994, Advanced Lithography.

High-Accuracy Defect-Free X-Ray Mask Technology.

R. Viswanathan, Kurt R. Kimmel, Mark A. McCord, 1994 .

UVN2-negative chemically amplified resist optimization for x-ray mask fabrication

Michael J. Lercel, Cameron J. Brooks, Douglas E. Benoit, 1999, Advanced Lithography.

ACLV control in x-ray lithography

Azalia A. Krasnoperova, Robert P. Rippstein, Janet M. Rocque, 1998, Advanced Lithography.

Fabrication of 64-Mb DRAM using x-ray lithography

Lars W. Liebmann, Ronald A. DellaGuardia, Chet Wasik, 1995, Advanced Lithography.