Nicolas A. Mauchamp

Molecular dynamics simulation of Si trench etching with SiO2 hard masks

S. Hamaguchi, Nicolas A. Mauchamp, 2022, Journal of Vacuum Science & Technology A.

Why are physical sputtering yields similar for incident ions with different masses?—physical sputtering yields of the Lennard–Jones system

S. Hamaguchi, Nicolas A. Mauchamp, 2022, Journal of Physics D: Applied Physics.

Self-sputtering of the Lennard–Jones crystal

S. Hamaguchi, M. Isobe, K. Ikuse, 2022, Physics of Plasmas.