Jim Kennon

发表

Fabrication of EUVL micro-field exposure tools with 0.5 NA

Mark Bremer, Luc Girard, Lou Marchetti, 2015, SPIE Optifab.

Update on the SEMATECH 0.5 NA Extreme-Ultraviolet Lithography (EUVL) Microfield Exposure Tool (MET)

Dominic Ashworth, Regina Soufli, Michael Goldstein, 2014, Advanced Lithography.

Projection optics for extreme ultraviolet lithography (EUVL) micro-field exposure tools (METs) with a numerical aperture of 0.5

Dominic Ashworth, Regina Soufli, Michael Goldstein, 2013, Advanced Lithography.