Bob Kestner

Fabrication of EUVL micro-field exposure tools with 0.5 NA

Mark Bremer, Luc Girard, Lou Marchetti, 2015, SPIE Optifab.

Update on the SEMATECH 0.5 NA Extreme-Ultraviolet Lithography (EUVL) Microfield Exposure Tool (MET)

Dominic Ashworth, Regina Soufli, Michael Goldstein, 2014, Advanced Lithography.

Projection optics for extreme ultraviolet lithography (EUVL) micro-field exposure tools (METs) with a numerical aperture of 0.5

Dominic Ashworth, Regina Soufli, Michael Goldstein, 2013, Advanced Lithography.

Current development status of HSFET (High NA Small Field Exposure Tool) in EIDEC

Shunko Magoshi, Satoshi Tanaka, Soichi Inoue, 2016, SPIE Advanced Lithography.

Sapphire mirror for the KAGRA gravitational wave detector

Hiroaki Yamamoto, Takaaki Kajita, Masatake Ohashi, 2014 .