Steven G. Hummel

Back end of line metrology control applications using scatterometry

Christopher J. Raymond, Darren Forman, Linda Towidjaja, 2006, SPIE Advanced Lithography.

Effect of grating pitch variation on scatterometry measurements

Christopher J. Raymond, Darren Forman, Mike Littau, 2006, SPIE Advanced Lithography.

Dome scatterometry for the measurement of advanced geometry semiconductor devices

Christopher J. Raymond, Darren Forman, Mike Littau, 2006, SPIE Advanced Lithography.

Diffraction signature analysis methods for improving scatterometry precision

Christopher J. Raymond, Darren Forman, Mike Littau, 2006, SPIE Advanced Lithography.

Simulation of flow and growth phenomena in a close-spaced reactor

Klavs F. Jensen, Steven G. Hummel, K. Jensen, 1998 .

Nonlinear Bragg reflector based on saturable absorption

P. D. Dapkus, Steven G. Hummel, E. Garmire, 1989 .