Bin-Feng Huang

Thermal Stability Improvement of the Ni Germano-silicide formed by a novel structure Ni/Co/TiN using 2-step RTP for Nano-Scale CMOS Technology

Jeong-Gun Lee, Yong-Goo Kim, Hi-Deok Lee, 2004 .

Study of Abnormal Oxidation of Ni-Germanosilicide by High Temperature Post-Silicidation Annealing(Session A3 Si Materails and Process)(2004 Asia-Pacific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD 2004))

Jeong-Gun Lee, Yong-Goo Kim, Hi-Deok Lee, 2004 .

Thermally Robust Nickel Silicide Process for Nano-Scale CMOS Technology

Yong-Jin Kim, Soon-Young Oh, Hi-Deok Lee, 2005, IEICE Trans. Electron..