S. Hofmann

发表

Preferential sputtering effects in depth profiling of multilayers with SIMS, XPS and AES

B. Lin, J. Kováč, G. Zhou, 2019, Applied Surface Science.

Depth resolution and preferential sputtering in depth profiling of delta layers

S. Lian, Y. Liu, J.Y. Wang, 2018, Applied Surface Science.

Depth resolution in sputter profiling revisited

W. Jian, Y. Liu, J.Y. Wang, 2016 .

An analytical depth resolution function for the MRI model

Y. Liu, S. Hofmann, J. Y. Wang, 2013 .

Influence of nonstationary atomic mixing on depth resolution in sputter depth profiling

J. Kovač, Y. Liu, S. Hofmann, 2012 .

Backscattering effect in quantitative AES sputter depth profiling of multilayers

A. Zalar, S. Hofmann, J. Y. Wang, 2007 .

Sputter depth profiling: past, present, and future

S. Hofmann, 2014 .

AES depth profiling with a tilted sample in front of a cylindrical mirror analyzer: quantification and profile shape changes according to an extension of the conventional MRI model

S. Hofmann, Jiangyong Wang, S. Hofmann, 2007 .

Quantification of AES depth profiling data of polycrystalline Al films with Gaussian and non‐Gaussian surface height distributions

W. Jian, Y. Liu, S. Rao, 2013 .

Improvement of the depth resolution in sputter depth profiling by elastic peak electron spectroscopy

V. Kesler, S. Hofmann, 2002 .

Variation of the electron inelastic mean free path during depth profiling of the Fe/Si interface as determined by quantitative REELS

J. Sanz, E. Elizalde, P. Prieto, 2004 .