K. Shinohara

Oxygen striation and thermally induced microdefects in Czochralski‐grown silicon crystals

A. Ohsawa, K. Honda, S. Ohkawa, 1980 .

New Ultra-High-Frequency Plasma Source for Large-Scale Etching Processes

S. Samukawa, T. Tsukada, Y. Nakagawa, 1995 .

High‐quality GaN epitaxial layer grown by metalorganic vapor phase epitaxy on (111) MgAl2O4 substrate

A. Kuramata, T. Tanahashi, K. Horino, 1995 .

Low‐temperature, uniform, and high‐density plasma produced by a new ultra‐high‐frequency discharge with a spokewise antenna

S. Samukawa, T. Tsukada, Y. Nakagawa, 1995 .

New plasma source with an UHF (500 MHz) antenna

S. Samukawa, T. Tsukada, Y. Nakagawa, 1996 .