T. Sato
发表
Y. Mizuhara,
Y. Takai,
K. Kikuchi,
2005
.
H. Nishiyama,
T. Sato,
D. Ito,
2005,
IEEE Transactions on Industry Applications.
Aluminum oxide films deposited in low pressure conditions by reactive pulsed dc magnetron sputtering
T. Sato,
T. Seino,
T. Sato,
2002
.
J. Allen,
H. Thomas,
G. Morfill,
2009
.
H. Matsumoto,
T. Sato,
M. Kiyohara,
2020,
Journal of microscopy.
T. Sato,
T. Urayama,
R. Ramasamy,
2006,
IEEE Transactions on Industry Applications.
T. Urayama,
R. Ramasamy,
K. Fujioka,
2004,
Conference Record of the 2004 IEEE Industry Applications Conference, 2004. 39th IAS Annual Meeting..
J. Lowke,
A. Murphy,
Manabu Tanaka,
2009
.
K. Nogi,
H. Fujii,
S. Lu,
2007
.
H. Maezawa,
T. Sato,
T. Noguchi,
2005,
IEEE Transactions on Applied Superconductivity.
J. Lowke,
A. Murphy,
S. Tashiro,
2009
.
Y. Ueno,
S. Takemori,
H. Seki,
2000
.
H. Nishiyama,
Takehiko Sato,
A. Veefkind,
1995
.
O. Furuya,
T. Nakatani,
T. Sato,
2009,
IEEE Transactions on Industry Applications.
S. Nagaya,
N. Hirano,
T. Tamada,
2007
.
H. Nishiyama,
K. Katagiri,
T. Sato,
2001
.