T. Katayama

Oxygen Concentration in the Top Silicon Layer of Silicon-on-Insulator Materials Formed by Low-Dose Implantation of Oxygen

Y. Miyamura, J. Jabłoński, M. Saito, 1996 .

Investigations on High‐Temperature Thermal Oxidation Process at Top and Bottom Interfaces of Top Silicon of SIMOX Wafers

Katsutoshi Izumi, Masato Imai, Sadao Nakashima, 1996 .