I. Teerlinck

Critical issues in post Cu CMP cleaning

M. Heyns, R. Vos, P. Mertens, 2000, Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130).

Implementation of the IMEC-Clean in advanced CMOS manufacturing

M. Heyns, R. Vos, M. Meuris, 1999, 1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat No.99CH36314).