E. Steve Putna
发表
EUV lithography for 22nm half pitch and beyond: exploring resolution, LWR, and sensitivity tradeoffs
Manish Chandhok,
Todd R. Younkin,
Terence Bacuita,
2011,
Advanced Lithography.
EUV lithography for 30nm half pitch and beyond: exploring resolution, sensitivity, and LWR tradeoffs
Manish Chandhok,
Todd R. Younkin,
E. Steve Putna,
2009,
Advanced Lithography.
Paul Zimmerman,
Jeanette M. Roberts,
Robert P. Meagley,
2003,
SPIE Advanced Lithography.
EUV lithography for 22nm half pitch and beyond: exploring resolution, LWR, and sensitivity tradeoffs
Manish Chandhok,
Todd R. Younkin,
E. Steve Putna,
2010,
Advanced Lithography.
Stefan Wurm,
Abbas Rastegar,
E. Steve Putna,
2010,
Advanced Lithography.
Manish Chandhok,
Todd R. Younkin,
E. Steve Putna,
2011
.
Manish Chandhok,
Wang Yueh,
Todd R. Younkin,
2008
.