Hiroshi Ohtsuka

发表

Double Structured Alignment Mark For Enhanced Automatic Alignment

Hiroshi Ohtsuka, Takashi Taguchi, Gohichi Kushibiki, 1985, Advanced Lithography.

The Basics, the Application and Great Possibilities of IC Tags

Hiroshi Ohtsuka, 2005 .

Present status of ArF lithography development and mask technology

Hiroshi Ohtsuka, Hiroaki Morimoto, 1998, Photomask and Next Generation Lithography Mask Technology.

Wheel-Based Stair Climbing Robot with Hopping Mechanism - Demonstration of Continuous Stair Climbing Using Vibration -

Koki Kikuchi, Hiroshi Ohtsuka, Yasuhiro Chiba, 2008, J. Robotics Mechatronics.

Pcm Resist Process With Rie Development Method Applied For The Aluminum Etching Process

Yoshio Itoh, Hiroshi Ohtsuka, Jun Kanamori, 1986, Advanced Lithography.

New method for etching rate and resist profile control in O2RIE

Hiroshi Ohtsuka, Seki Suzuki, Yasuki Kimura, 1993, Other Conferences.

Parameters Affecting The Ability To Align Aluminum Layers On An Optical Wafer Stepper

Hiroshi Ohtsuka, Toshiaki Koikeda, Hiroyuki Funatsu, 1984, Advanced Lithography.

2102 The study of the development for the narrow type walking assist device

Yukio Kawakami, Hiroshi Ohtsuka, Hiroshi Okamura, 2009 .

A Proof of the Substitution Lemma in de Bruijn's Notation

Hiroshi Ohtsuka, 1993, Inf. Process. Lett..

Overview of Development of Rescue Robot Systems

Hiroshi Ohtsuka, Fumitoshi Matsuno, F. Matsuno, 2005 .

Quantitative evaluation method for practical resolution by integration factor in optical lithography

Hiroshi Ohtsuka, Takeshi Taguchi, Kazutoshi Abe, 1990, Advanced Lithography.

Simulation ride a motorcycle

Yukio Miyamaru, Hiroshi Ohtsuka, Katsuhito Aoki, 1990 .

Quantitative Evaluation Method at Conjugate Point for Practical Resolution of Wafer Stepper

Hiroshi Ohtsuka, Kazutoshi Abe, Y. Itoh, 1989, Advanced Lithography.

2P1-C09 A Study on Fast Stair Climbing by Vehicle using Vibration of 2-DOF System : Control of Soft-landing Point using Wire Tension

Koki Kikuchi, Hiroshi Ohtsuka, Yasuhiro Chiba, 2008 .

Examination of the effectiveness of intervention procedure of a behavior analysis for workers in an experimental work site introducing a mobile robot

Kyoko Hamajima, Hiroki Ito, Hiroshi Ohtsuka, 2018 .

Enhancement of Defocus Characteristics with Intermediate Phase Interference in Phase Shift Method (Special Issue on Quarter Micron Si Device and Process Technologies)

Takashi Taguchi, Hiroshi Ohtsuka, Toshio Onodera, 1994 .

ArF excimer laser lithography with bottom antireflective coating

Masaru Sasago, Hiroshi Ohtsuka, Takeshi Ohfuji, 1998, Advanced Lithography.

The validity examination of the safeguarding supportive system (SSS) at an experimental work site of an integrated manufacturing system (IMS) introducing a mobile robot

Kyoko Hamajima, Hiroki Ito, Hiroshi Ohtsuka, 2018 .

Multiple shifter arrays for repairing phase defects in conjugate twin-shifter phase-shift mask

Hiroshi Ohtsuka, Toshio Onodera, Kazuyuki Kuwahara, 1993, Advanced Lithography.

Conjugate twin-shifter masks with multiple focal planes

Takashi Taguchi, Hiroshi Ohtsuka, Toshio Onodera, 1992, Advanced Lithography.

Acid amplification of chemically amplified resists for 193-nm lithography

Hiroshi Ohtsuka, Takeshi Ohfuji, Makoto Takahashi, 1997, Advanced Lithography.

Recent Twenty Five Years' Progress of the Potato Starch Industry in Japan

Hiroshi Ohtsuka, 1983 .

On the Operational Grasp of the Participative Budgeting

Hiroshi Ohtsuka, 1989 .

Conjugate twin-shifter for the new phase-shift method to high-resolution lithography

Hiroshi Ohtsuka, Toshio Onodera, Kazutoshi Abe, 1991, Other Conferences.

Replica-Exchange Monte Carlo Method for Ar Fluid

Yuko Okamoto, Takeshi Nishikawa, Masuhiro Mikami, 2000 .

Fabrication of 0.13-μm Device Patterns by Argon Fluoride Excimer Laser Lithography with Practical Resolution Enhancement Techniques

Masaru Sasago, Hiroshi Ohtsuka, Takeshi Ohfuji, 1997 .