M. Schmidt

High Definition Digital Fabrication of Active Organic Devices by Molecular Jet Printing

V. Bulović, D. Schut, V. Leblanc, 2007 .

Sub-diffraction-limited multilayer coatings for the 0.3 numerical aperture micro-exposure tool for extreme ultraviolet lithography.

Regina Soufli, Jeff C. Robinson, Eberhard Spiller, 2007, Applied optics.

Flat-field grating spectrometer for high-resolution soft x-ray and extreme ultraviolet measurements on an electron beam ion trap

P. Beiersdorfer, Hui-Hwa Chen, M. Gu, 2004 .

Multilayer optics for an extreme-ultraviolet lithography tool with 70-nm resolution

Regina Soufli, Stanley Mrowka, Claude Montcalm, 2001, SPIE Advanced Lithography.

Atomic-precision multilayer coating of the first set of optics for an extreme-ultraviolet lithography prototype system.

Marco Wedowski, Claude Montcalm, Eberhard Spiller, 2002, Applied optics.