Hyun-Sang Joo

Ring opened maleic anhydride and norbornene copolymers (ROMA) have a good character in resist flow process for 193-nm resist technology

Hyun-Sang Joo, Dong-Chul Seo, Chang Min Kim, 2003, SPIE Advanced Lithography.

Novel approach for high resolution using cycloolefin-alt-maleic acid derivatives polymer for ArF lithography

Hyun-Sang Joo, Joo Hyeon Park, Dong-Chul Seo, 2002, SPIE Advanced Lithography.