Seong Duk Cho

Ring opened maleic anhydride and norbornene copolymers (ROMA) have a good character in resist flow process for 193-nm resist technology

Hyun-Sang Joo, Dong-Chul Seo, Chang Min Kim, 2003, SPIE Advanced Lithography.

High-performance 193-nm photoresist materials based on ROMA polymers: sub-90-nm contact hole application with resist reflow

Dong-Chul Seo, Chang Min Kim, Young Taek Lim, 2004, SPIE Advanced Lithography.