Seung-Chan Moon

发表

Ring opened maleic anhydride and norbornene copolymers (ROMA) have a good character in resist flow process for 193-nm resist technology

Hyun-Sang Joo, Dong-Chul Seo, Chang Min Kim, 2003, SPIE Advanced Lithography.

0.31k1 ArF lithography for 70-nm DRAM

Jun-Taek Park, Chang-Moon Lim, Cheol-Kyu Bok, 2005, SPIE Advanced Lithography.

Characterization of the quarter-micron i-line lithography using a top surface imaging process

Chang-Moon Lim, Seung-Chan Moon, Soo-Han Choi, 1994, Advanced Lithography.

Influence of process parameters on the lithographic performance characterization in the top imaging process by silylation

Seung-Chan Moon, Jin-Woong Kim, Soo-Han Choi, 1993, Advanced Lithography.

The suppression method of powder formation in ArF photoresist

Cheol-Kyu Bok, Seung-Chan Moon, Myoung-Soo Kim, 2006, SPIE Advanced Lithography.

Rinse liquid to improve pattern collapse behavior

Cheol-Kyu Bok, Seung-Chan Moon, Ki-Soo Shin, 2003, SPIE Advanced Lithography.

Comparative study of chromeless and attenuated phase shift mask for 0.3-k1 ArF lithography of DRAM

Ki Soo Shin, Seung-Chan Moon, Hee-Bom Kim, 2003, SPIE Advanced Lithography.

Highly Scalable Saddle-Fin (S-Fin) Transistor for Sub-50nm DRAM Technology

Kwang-Ok Kim, Seung-Chan Moon, Jin-Soo Kim, 2006, 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers..

Application of scatterometry to measure organic material profile

Sunyoung Koo, Chang-Moon Lim, Keundo Ban, 2006, SPIE Advanced Lithography.

Optimization of material and process parameter for minimizing defect in implementation of MFHM process

Junggun Heo, Keundo Ban, Cheol-Kyu Bok, 2007, SPIE Advanced Lithography.

Study on the reduction of defects in immersion lithography

Junggun Heo, Keundo Ban, Cheol-Kyu Bok, 2007, SPIE Advanced Lithography.

Positive and negative tone double patterning lithography for 50nm flash memory

Chang-Moon Lim, Keundo Ban, Seung-Chan Moon, 2006, SPIE Advanced Lithography.

Hyper NA polarized imaging of 45nm DRAM

Jun-Taek Park, Chang-Moon Lim, Seung-Chan Moon, 2007, SPIE Advanced Lithography.

Comparative study of binary intensity mask and attenuated phase shift mask using hyper-NA immersion lithography for sub-45nm era

Sunyoung Koo, Jun-Taek Park, Chang-Moon Lim, 2008, SPIE Advanced Lithography.

Development of multi-function hard mask to simplify process step

Cheol-Kyu Bok, Seung-Chan Moon, Won-Kyu Kim, 2006, SPIE Advanced Lithography.

Comparative study of DRAM cell patterning between ArF immersion and EUV lithography

Sunyoung Koo, Jun-Taek Park, Chang-Moon Lim, 2009, Advanced Lithography.

Effective alignment techniques and their implementation to enhance total overlay accuracy on highly reflective films

Ki-Ho Baik, Seung-Chan Moon, Soo-Han Choi, 1995, Advanced Lithography.

Implementation of i-line lithography to 0.30 um design rules

Jin-Soo Kim, Ki-Ho Baik, Seung-Chan Moon, 1995, Advanced Lithography.

Diffusion contributions to line end shortening in 193-nm photolithography

Keundo Ban, Seung-Chan Moon, Sang-Hyang Lee, 2005, SPIE Advanced Lithography.

Hardware, materials, and parameters optimization for improvement of immersion overlay

Chang-Moon Lim, Seung-Chan Moon, Won-Kwang Ma, 2007, SPIE Advanced Lithography.

Highly scalable Z-RAM with remarkably long data retention for DRAM application

Tae-Su Jang, Seung-Chan Moon, Young H. Oh, 2006, 2009 Symposium on VLSI Technology.

Double exposure technology using silicon containing materials

Chang-Moon Lim, Cheol-Kyu Bok, Seung-Chan Moon, 2006, SPIE Advanced Lithography.

Improvement of front-end process overlay in 60nm DRAM

Chang-Moon Lim, Seung-Chan Moon, Won-Kwang Ma, 2007, SPIE Advanced Lithography.

Photoresist Adhesion Effect of Resist Reflow Process

Hye-Keun Oh, Seung-Chan Moon, Seung-Wook Park, 2007, SPIE Advanced Lithography.

Alignment system and process optimization for improvement of double patterning overlay

Chang-Moon Lim, Seung-Chan Moon, Won-Kwang Ma, 2008, SPIE Advanced Lithography.

EUV-patterning characterization using a 3D mask simulation and field EUV scanner

Sunyoung Koo, Jun-Taek Park, Chang-Moon Lim, 2009, Advanced Lithography.

Issues and challenges of double patterning lithography in DRAM

Sunyoung Koo, Chang-Moon Lim, Seung-Chan Moon, 2007, SPIE Advanced Lithography.

Practical methodology of optical proximity correction in subquarter-micron lithography

Chang-Moon Lim, Seung-Chan Moon, Bong-Ho Kim, 1999, Advanced Lithography.

Minimization of DUV multi-interference effect in 0.25-μm device fabrication

Daehee Kim, Seung-Chan Moon, Ki-Soo Shin, 1997, Advanced Lithography.

Alternative technology for double patterning process simplification

Cheol-Kyu Bok, Seung-Chan Moon, Jaeheon Kim, 2008, Lithography Asia.

Resolution enhanced top anti reflective coating materials for ArF immersion lithography

Keundo Ban, Cheol-Kyu Bok, Seung-Chan Moon, 2006, SPIE Advanced Lithography.

Study on imaging characterization of ArF high index immersion lithography

Jun-Taek Park, Seung-Chan Moon, Jin-Soo Kim, 2008, Lithography Asia.

Polymer structure modifications for immersion leaching and watermark control

Jae-Hyun Kim, Seung-Chan Moon, Deog-Bae Kim, 2006, SPIE Advanced Lithography.

Compensation of intrafield registration error caused by process properties in optical lithography

Jeong Soo Kim, Seung-Chan Moon, Hyun-Sub Kim, 1996, Advanced Lithography.

Parameter investigation of PEB sensitivity

Seung-Chan Moon, Geunsu Lee, Jae-Hyun Kim, 2006, SPIE Advanced Lithography.

Origin of LER and its solution

Chang-Moon Lim, Cheol-Kyu Bok, Seung-Chan Moon, 2005, SPIE Advanced Lithography.

Study on the shoreline for water immersion ArF lithography

Chang-Moon Lim, Cheol-Kyu Bok, Seung-Chan Moon, 2004, SPIE Advanced Lithography.

Improvement of alignment and overlay accuracy on amorphous carbon layers

Chang-Moon Lim, Keundo Ban, Cheol-Kyu Bok, 2006, SPIE Advanced Lithography.

New approach for pattern collapse problem by increasing contact area at sub-100nm patterning

Jae Chang Jung, Ki Soo Shin, Seung-Chan Moon, 2003, SPIE Advanced Lithography.

Bulk effects of thermal flow resists

Cheol-Kyu Bok, Hye-Keun Oh, Seung-Chan Moon, 2005 .

Dry Etching of High-k Dielectric Thin Films in HBr/Ar Plasma

Seung-Chan Moon, Gwan-Ha Kim, Sang-Wook Park, 2009 .

Quantitive analysis of the proximity effect in optical lithographic process

Seung-Chan Moon, Sang-Man Bae, Young-Mog Ham, 1994 .

Material Issues in Real Device Application of Multi-function Hard Mask Process

Seung-Chan Moon, Won-Kyu Kim, Kilyoung Lee, 2006 .