Xinyi Tang

The Effects of Postdeposition Anneal and Postmetallization Anneal on Electrical Properties of TiN/ZrO2/TiN Capacitors

Guangwei Xu, Yuanbiao Li, Shibing Long, 2023, IEEE Transactions on Electron Devices.

The Atomic Layer Etching Technique with Surface Treatment Function for InAlN/GaN Heterostructure

Fangzhou Du, Yang Jiang, Qing Wang, 2022, Crystals.

Atomic layer etching technique for InAlN/GaN heterostructure with AlN etch-stop layer

Fangzhou Du, Guangnan Zhou, Yang Jiang, 2022, Materials Science in Semiconductor Processing.

Microscopic formation mechanism of Si/Tl5Al1/TiN ohmic contact on non-recessed i-InAlN/GaN heterostructures with ultra-low resistance

Fangzhou Du, Yang Jiang, Qing Wang, 2022, Applied Physics Letters.