B. Minghetti

Electron beam lithography simulation based on a single convolution approach: application for sub-45nm nodes

S. Manakli, L. Pain, J. C. Le denmat, 2007, European Mask and Lithography Conference.

Transitioning of direct e-beam write technology from research and development into production flow

J. Todeschini, L. Pain, B. Icard, 2006 .