A. Aidla

Atomic Layer Deposition of Thin Films Using O2 as Oxygen Source

M. Schuisky, K. Kukli, A. Hårsta, 2001 .

Electrical characterization of high-k based MIS capacitors using flat-band voltage transients

M. Ritala, J. Aarik, L. Bailon, 2009, 2009 Spanish Conference on Electron Devices.

Growth of High-Dielectric-Constant TiO2 Films in Capacitors with RuO2 Electrodes

J. Aarik, M. Ťapajna, E. Dobročka, 2008 .

High-permittivity metal-insulator-metal capacitors with TiO2 rutile dielectric and RuO2 bottom electrode

J. Aarik, T. Lalinsky, E. Dobročka, 2010 .