J. Richard

Electrical Properties of Amorphous Silicon Transistors and MIS‐Devices: Comparative Study of Top Nitride and Bottom Nitride Configurations

Jean-Paul Kleider, Joseph Richard, Alain Rolland, 1993 .

Al/Al2O3/InP MIS structures

P. Favennec, M. L. Contellec, G. Pelous, 1979 .

Hydrogen content of amorphous silicon carbide prepared by reactive sputtering: Effects on films properties

E. Ligeon, A. Guivarc’h, J. Fontenille, 1980 .

Effects of the silicon-to-carbon ratio and the hydrogen content in amorphous SiC thin films prepared by reactive sputtering

Joseph Richard, M. Le Contellec, A. Guivarc'h, 1979 .