Vincent Truffert

A new paradigm for in-line detection and control of patterning defects

Sandip Halder, Venu Vellanki, Stefan Hunsche, 2015, Advanced Lithography.

Pattern shift response metrology

Philippe Leray, Vincent Truffert, Kit Ausschnitt, 2018, Photomask Technology.

Comparing positive and negative tone development process for printing the metal and contact layers of the 32- and 22-nm nodes

Geert Vandenberghe, Shinji Tarutani, Joost Bekaert, 2010 .

Combined illumination sources for hyper-NA contact hole printing

Maaike Op de Beeck, Joost Bekaert, Vincent Truffert, 2007 .

Process development using negative tone development for the dark field critical layers in a 28nm node process

Vincent Wiaux, Peter De Bisschop, Monique Ercken, 2012, Advanced Lithography.

Ultimate contact hole resolution using immersion lithography with line/space imaging

Mireille Maenhoudt, Joost Bekaert, Timothy Wu, 2009, Advanced Lithography.

Immersion lithography and double patterning in advanced microelectronics

Vincent Wiaux, Geert Vandenberghe, Mireille Maenhoudt, 2010, International Conference on Micro- and Nano-Electronics.

Patterning challenges in setting up a 16nm node 6T-SRAM device using EUV lithography

Staf Verhaegen, Monique Ercken, Mircea Dusa, 2011, Advanced Lithography.

Novel monitoring of EUV litho cluster for manufacturing insertion

Vincent Truffert, Kit Ausschnitt, Vineet V. Nair, 2020, Advanced Lithography.