Kaname Okada

Hard pellicle study for 157-nm lithography

Roxann L. Engelstad, Edward G. Lovell, Emily Y. Shu, 2002, Photomask Japan.

Development of hard pellicle for 157 nm

Yoshiaki Ikuta, Takayuki Kawahara, Hiroshi Kojima, 2002, Photomask Japan.

Hard pellicle investigation for 157-nm lithography: impact on overlay

Peter De Bisschop, Roxann L. Engelstad, Richard Bruls, 2004, European Mask and Lithography Conference.

New modified silica glass for 157-nm lithography

Yoshiaki Ikuta, Takayuki Kawahara, Kaname Okada, 2000, Photomask Japan.